Canon FPA-1550MkIV-W
The Canon FPA-1550MkIV-W integrates a 5:1 reduction ratio g-Line lens (436nm) which has both a high NA and a 20mm x 20mm image field, with all the performance features to support a 0.65µm design rule. Optimum wafer leveling is assured by either a die-by-dye or global leveling system. The widest diversity of processes and materials can be accommodated by a multiple mode automatic alignment system. Increased productivity is facilitated by a high speed reticle changer and X-Y stage as well as in-Line and on-Line capabilities.